Point type evaporation source is traditional evaporation source, which can be used to make film of high temperature material over 1000 ℃ as well as low temperature organic material.
It can usefully used for manufacturing small-sized product, which is mainly used for OLED and CIGS solar cell R&D equipment.
Nozzle type and open type crucible can be used and most of metal materials except Al material can be used for deposition. In the case that it is applied for large-scaled thin film, substrate should be rotated to ensure uniformity.
As evaporation source to make film for various inorganic materials and Al used for manufacturing OLED and CIGS thin film, it can be applied for mass production in max. 1300℃. In using it for substrate of the 4th generation and higher, substrate should be rotated.
As for Al, it can be deposited by max. 10 Å/s. YAS’s high temperature evaporation source improves heater’s structure and material, which is the product having strong duration of low heating part’s deformation and damage and is suitable for long-term mass production. Also, crucible of cone type is applied for it in order to minimize aging change. In order to manufacture large-scaled product of the 4th generation and higher, we are developing the product not requesting substrate’s rotation.
    LTPNS HTPNS Metal Source
Heating Part Filament One Or Dual uniform Filament Cold lip type
Filament Material Ta Ta  or  W Ta  or  W
Operating Temp. ~ 600 ℃ ~ 1400 ℃ ~ 1400 ℃
Thermocouple Double wire K - type Double wire C - type Double wire C - type
Power spec. 20VDC  10A 50VDC  12A 80VDC  50A
Crucible & Inset Material High Purity Graphite with special coating Al2O3 , Quartz AlN, PBN
Capacity (cc) 10, 40, 90, 120, 150 10, 40, 90, 120 10, 40, 75, 100, 200
Deposition Rate 0.01 Å/s ~ ~ 10 Å/s
Uniformity Various with source position
Water jacket Cooling One body water jacket,  ¼” Tube Inlet
Mounting Flange 4.5” ~      (CF, O-ring)
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