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| Like existing linear source, it is the method to scan substrate or evaporation source but by using rectangle nozzle part, it is the evaporation source of new concept to improve long linear source’s demerit. |
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30% compared to existing linear source length |
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Material using efficiency: 30%~40%, thin film evenness is below 3 % |
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Because of long TS and small nozzle, heat transfer to mask is small |
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Shadow’s influence is small |
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3.5th Gen. CNS
730 × 460 |
| Dimension (L * W * H) |
85 x 213 x 230 |
| Capacity |
900 cc |
| Powe |
36VDC 11A |
| Deposition Rate |
Up to 5 Å/s |
| Uniformity |
Less than ± 3%, Substrate or Source Scan |
| Maximum operating Temp. |
600 ℃ |
| Thermocouple |
Double wire K - type |
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